Planar epitaxial refill using liquid phase epitaxy
We claim: 1. A method of refilling grooves in a silicon wafer of predetermined conductivity type by epitaxial growth of silicon from the liquid phase, comprising: establishing an oxide layer on a surf... Read More
Inventors: Baliga, Bantval J.; Gidley, Gerald B.;, Assignee: General Electric Company (Schenectady, NY) |
Semiconductor integrated circuit device with a high tolerance against abnormally high input voltage
I claim: 1. A semiconductor integrated device having a high tolerance against abnormally high input voltages, comprising: a semiconductor substrate having a first conductivity type; an input electrode... Read More
Inventors: Miyasaka, Kiyoshi;, Assignee: Fujitsu Limited (Kawasaki, JP) |
Electron beam enhanced surface modification for making highly resolved structures
Against the described background, it is therefore a general object of the present invention to provide a method of forming submicron structures, especially those structures that have a feature width a... Read More
Inventors: Pitts, John R.;, Assignee: The United States of America as represented by the United States (Washington, DC) |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** *** NO IMAGES AVAILABLE***
Description:... Read More
Inventors: , Assignee: |
Plasma processing method for improving a package of a semiconductor device
An object of the present invention is to provide, with due consideration to the drawbacks of such conventional devices, an electronic device in which the decrease in reliability is prevented. Another ... Read More
Inventors: Yamazaki, Shunpei; Tsuchiya, Mitsunori; Urata, Kazuo; Koyama, Itaru; Imatou, Shinji; Hayashi, Shigenori; Hirose, Naoki; Sasaki, Mari; Ishida, Noriya; Wada, Kouhei;, Assignee: Semiconductor Energy Laboratory Co., Ltd. (Kanagawa, JP) |
Method of electron beam exposure
One object of this invention is to provide a method of electron beam exposure in which, when a resist film on a substrate is exposed with an electron beam, the scattering of the electron beam in the r... Read More
Inventors: Komatsu, Fumio;, Assignee: Tokyo Shibaura Denki Kabushiki Kaisha (JP) |
Device for recognizing the impact site of a charge carrier beam on a target
The invention is therefore based on the task of obtaining an actual position signal of the impact point of an electron beam on a target which is independent of the melt material level. This task is so... Read More
Inventors: Benes, Ewald; Groschl, Martin; Schmid, Michael; Siegmund, Hans-Joachim; Thomas, Friedrich-Werner; Thorn, Gernot;, Assignee: Leybold Aktiengesellschaft (DE) |
Method for dry etching vias in integrated circuit layers
OF THE DRAWINGS Referring to FIG. 1, a schematic representation of an etching apparatus according to the present invention is shown and is generally designated 100. Apparatus 100 is more commonly kno... Read More
Inventors: Elkind, Jerome L.; Smith, Patricia B.; Hutchins, Larry D.; Luttmer, Joseph D.; York, Rudy L.; England, Julie S.;, Assignee: Texas Instruments Incorporated (Dallas, TX) |
Process for forming a buried drain or collector region in monolithic semiconductor devices
The process in accordance with the invention aims at overcoming the above drawbacks. A first innovative process embodiment comprises the following steps: growing on a substrate having a first type of ... Read More
Inventors: Zambrano, Raffaele;, Assignee: SGS Thomson Microelectronics, S.r.l. (Agrate Brianza, IT) |
Golf ball
OF THE INVENTION The present invention is directed to improved core construction and several methods for improving core construction. Broadly, the golf ball core of the invention consists of a spheri... Read More
Inventors: Nesbitt, R. Dennis; Sullivan, Michael J.; Melvin, Terence;, Assignee: Lisco, Inc. (Tampa, FL) |
Optoelectronic switching and display device with porous silicon
It is a principal object of the present invention to overcome the above shortcomings by providing a solid state optoelectronic switching and display device for high powered computers that employs ligh... Read More
Inventors: Namavar, Fereydoon; Kalkhoran, Nader M.; Maruska, H. Paul;, Assignee: Spire Corporation (Bedford, MA) |
Method of forming porous silicon
It is an object of the present invention to provide a process for manufacturing porous silicon having a high degree of uniformity. Another object of the invention is to fabricate uniformly porous sili... Read More
Inventors: Pamulapati, Jagadeesh; Shen, Hongen; Dutta, Mitra;, Assignee: The United States of America as represented by the Secretary of the Army (Washington, DC) |
Lightweight neutron detector
What is claimed is: 1. In a neutron detector including a metallic encasement containing a neutron detecting gas and further including a moderator material disposed on the outer surface of said metalli... Read More
Inventors: Young, Charles A.; Geelhood, Bruce D.; Silva, Dennis M.;, Assignee: The United States of America as represented by the Secretary of the Navy (Washington, DC) |
Method of forming a salicided self-aligned metal oxide semiconductor device using a disposable silicon nitride spacer
A method of fabricating a SALICIDED complementary metal oxide semiconductor utilizing a very thin oxide spacer and a disposable nitride layer is disclosed. The method of the invention includes the ste... Read More
Inventors: Nasr, Andre I.;, Assignee: Digital Equipment Corporation (Maynard, MA) |
Method of fabricating semiconductor devices and integrated circuits using sidewall spacer technology
In accordance with one aspect of the invention, the base layer of sidewall spacer of a semiconductor device or integrated circuit comprises a composite multi-layered dielectric, preferably a multi-lay... Read More
Inventors: Chen, Min-Liang; Chittipeddi, Sailesh; Kook, Taeho; Powell, Richard A.; Roy, Pradip K.;, Assignee: Lucent Technologies Inc. (Murray Hill, NJ) |
Structure and method for manufacturing improved FETs having T-shaped gates
In view of the above, the invention is to provide a structure and method for manufacturing improved FETs having T-shaped gates which not only decrease the parasitic resistance of gate, but also can ef... Read More
Inventors: Lin, Horng-Chih; Huang, Tiao-Yuan;, Assignee: National Science Council (Taipei, TW) |
Method of fabricating a self-aligned silicide MOSFET
It is therefore an object of the invention to provide a reverse T-gate MOSFET device. The T-gate device possesses a wide, shallow junction to protect the device from the short channel effect. In accor... Read More
Inventors: Tseng, H. C.; Chen, Kun-Cho; Huang, Heng-Sheng;, Assignee: United Microelectronics Corp. (Hsin-Chu, TW) |
Partial silicidation method to form shallow source/drain junctions
This invention relates generally to semiconductor technology and more particularly to the formation of silicided electrodes in active semiconductor devices, such as MOS transistors. An important subje... Read More
Inventors: Maa, Jer-Shen; Hsu, Sheng Teng; Peng, Chien-Hsiung;, Assignee: Sharp Laboratories of America, Inc. (Camas, WA); Sharp Kabushiki Kaisha (Osaka, JP) |
Photopolymerization co-initiator systems
What is claimed is: 1. A photopolymerization co-initiator system which consists essentially of (a) about 1-30 parts of at least one compound having the formula ##SPC3## wherein R, R', and R" is each h... Read More
Inventors: Bean, Anthony J.;, Assignee: Sun Chemical Corporation (New York, NY) |
Photosensitive resin composition containing pullulan or esters thereof
What is claimed is: 1. A photosensitive resin composition comprising 30 to 90 parts by weight of at least one member selected from the group consisting of pullulan, an acetylation product of pullulan,... Read More
Inventors: Sano, Takezo; Uemura, Yukikazu; Furuta, Akihiro;, Assignee: Sumitomo Chemical Company, Limited (Osaka, JA); Hayashibara Biochemical Laboratories, Incorporated (Okayama, JA) |
Acyl benzyl ethers
What is claimed is: 1. A compound of the formula ##SPC4## where R.sub.1 and R.sub.2 each independently represent hydrogen, halo having an atomic weight of about 19 to 36, or straight chain lower alkyl... Read More
Inventors: Houlihan, William J.; Nadelson, Jeffrey;, Assignee: Sandoz, Inc. (E. Hanover, NJ) |
Photographic supports and elements utilizing photobleachable omicron-nitroarylidene dyes
I claim: 1. A process for preparing a photographic image which comprises imagewise exposing to electromagnetic radiation a light-sensitive photographic element comprising an otherwise transparent supp... Read More
Inventors: Sturmer, David M.;, Assignee: Eastman Kodak Company (Rochester, NY) |
Photo-imaging utilizing alkali-activated photopolymerizable compositions
What is claimed is: 1. The method of forming a polymeric image which comprises: a. providing photo-imaging material comprising a support and a coating thereon of a composition comprising an ethylenica... Read More
Inventors: Levinos, Steven;, Assignee: Keuffel & Esser Company (Morristown, NJ) |
Photopolymerizable compounds and compositions comprising the product of the reaction of a monomeric ester and a polycarboxy-substituted benzophenone
What is claimed is: 1. A photopolymerizable compound comprising the product of the reaction of (1) a monomeric hydroxy-containing polyethylenically unsaturated ester or (an) a monomeric isocyanatemodi... Read More
Inventors: Rosen, George;, Assignee: Sun Chemical Corporation (New York, NY) |
Stabilization of photosensitive recording material
We claim: 1. A recording process including image stabilization comprising the steps of: 1. image-wise exposing to active electromagnetic radiation of a recording material containing in a recording lay... Read More
Inventors: Kokelenberg, Hendrik Emmanuel; Samijn, Rafael Pierre; Van den Houte, Jozef Willy; Pollet, Robert Joseph;, Assignee: AGFA-GEVAERT N.V. (Mortsel, BE) |
Photopolymerization using an alpha-aminoacetophenone
I claim as my invention: 1. In a process for the photopolymerization of a polymerizable monomer wherein said monomer is subjected to the emission from an ultra-violet light source having a wave length... Read More
Inventors: Martan, Michael;, Assignee: UOP Inc. (Des Plaines, IL) |
Substituted (4-carboxyphenoxy) phenyl alkane compounds
We claim: 1. A compound of the formula: ##STR34## wherein R.sub.1 is a C.sub.1 to C.sub.7 alkyl carbonyl unsubstituted or substituted with carboxyl or C.sub.1 to C.sub.6 alkoxy carbonyl group converte... Read More
Inventors: Thorne, David Edward; Baggaley, Keith Howard; Morgan, Brian;, Assignee: Beecham Group Limited (GB) |
Method for desensitization of a color developer
OF THE INVENTION According to the process of this invention, drying at the time of desensitization coating or printing can be performed instantaneously, and even when the resulting desensitized surfa... Read More
Inventors: Miyamoto, Akio; Matsukawa, Hiroharu; Kobayashi, Teruo;, Assignee: Fuji Photo Film Co., Ltd. (Minami-ashigara, JA) |
Polymerizable esters
I claim: 1. An ester as a composition of matter, which is soluble in an aqueous solution of a base before exposure to actinic radiation, but which polymerizes on exposure to actinic radiation and beco... Read More
Inventors: Green, George Edward;, Assignee: Ciba-Geigy Corporation (Ardsley, NY) |
Photosensitive imageable composition containing a hexaaromaticbimidazole, a leuco dye and an oxygen-sensitizing compound
OF THE INVENTION Imageable compositions of the present invention may be conveniently prepared by dissolving a leuco form of dye, a hexaaromaticbiimidazole, and an oxygen sensitizing compound in an in... Read More
Inventors: Streeper, Richard D.;, Assignee: Minnesota Mining and Manufacturing Company (St. Paul, MN) |
Quantum Computing 
