Jet vapor deposition of organic molecule guest-inorganic host thin films

DETAILED DESCRIPTION An object of the present invention is to provide a system capable of depositing organic guest-inorganic host thin films at high rate and at low temperature.
Another object of the present invention is to provide a system of the foregoing type which allows for a large number of guest-host combinations.
Still another object of the present invention is to provide a system of the foregoing type which is compatible with vapor based integrated circuit manufacture.
Another object of the present invention is to provide a system of the foregoing type which needs no toxic film precursors or solvents.
Yet another object of the present invention is to provide a system of the foregoing type which allows for room temperature film deposition, leaving sensitive substrates and organic guests undamaged.
According to the present invention, a system for depositing organic guest-inorganic host films upon a substrate has the following components: 1) a vacuum chamber with one or more ports allowing access to the chamber interior 2) a vacuum pump for evacuating gas from the chamber 3) a positioning mechanism for locating and moving a substrate within the chamber 4) one or more jet vapor sources, affixed to the chamber ports, for admitting carrier gas and entrained condensible or reactive species to the chamber.