Physical vapor deposition of titanium nitride on a nonconductive substrate |
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Surfacing of aluminum bodies by anodic spark deposition |
| An object of the present invention is to satisfy this need by subjecting an aluminum or aluminum ... |
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Agent for the removal of low molecular weight organic gases |
| What is claimed is: 1. A process for removal of a low molecular weight organic gas selected from ... |
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Metal assisted carbon cold storage of hydrogen |
| Accordingly, it is an object of this invention to provide storage of hydrogen in a high surface ... |
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Carbon molecular sieves for purification of chlorofluorocarbons |
| I claim: 1. A process for the removal of hydrofluoric and hydrochloric acids from ... |
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Modified carbon molecular sieve adsorbents |
| He have found that kinetically oxygen-selective adsorbents can be prepared from a variety of porous ... |
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Use of helium and argon diluent gases in modification of carbon molecular sieves |
| OF THE INVENTION Air separation can be effected over carbon molecular sieve adsorbents which ... |
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Method for producing a decorative gold alloy coating
| Details |
Inventors: Schulz, Siegfried; Daube, Christoph; Belz, Alfred; Rack, Andreas;
Assignee: Leybold Aktiengesellschaft (Hanau, DE)
Primary Examiner: Nguyen; Nam
Assistant Examiner:
Attorney, Agent or Firm: Felfe & Lynch
For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics. |
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DETAILED DESCRIPTION This problem is solved in accordance with the invention in that the target required for the sputtering of different coatings is in each case made of the same alloy of gold and at least one element chosen from the group made up of titanium, vanadium, chromium, scandium, zirconium, niobium, molybdenum, hafnium, tantalum and tungsten. In order to influence the properties of the coating, the process parameters are varied, especially the concentration and composition of the reactive atmosphere in the coating apparatus or chamber. By the described procedure it is possible, by varying the content of the reactive gas mixture, to influence the color, the brightness and the hardness of the gold coating applied during the coating process. In this manner it becomes possible with a single alloy, and therefore with less capital tie-up, to produce very different coatings, especially hard, wear-resistant, variable-color, thin coatings. Thus, an extremely economical PVD process is available. The appearance and the hardness of the gold coating can be varied to an especially great extent within a practically advantageous range if vanadium is used as alloying component and nitrogen as the reactive gas. The most commonly used Swiss gold standards can be achieved if an alloy of pure gold and approximately 5 to 10 atomic percent of vanadium is used. An especially durable coating results if the coating according to the invention is applied to a hard-metal layer consisting of titanium nitride, for example, which has been produced by a PVD process from titanium with the use of nitrogen as reactive gas. These together with other objects and advantages which will be subsequently apparent, reside in the details of construction and operation as more fully hereinafter described and claimed, reference being had to the accompanying drawings forming a part hereof, wherein like numerals refer to like parts throughout.
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