High-voltage transistor and manufacturing method therefor |
| Therefore, it is an object of the present invention to provide a high-voltage transistor which can ... |
|
Inelastic, heat-elasticizable sheet material for diapers |
| In FIG. 1, heat-shrinkable composite 10 comprises a plurality of parallel elastomeric strands, ... |
|
Disposable diaper with a repositionable tape tab fastener |
| According to the present invention, a disposable diaper is provided which has a pressure-sensitive ... |
|
Cryoenucleation tool |
| I claim: 1. Apparatus for cryoenucleating a tumor of the eye comprising: a spoon of thermally ... |
|
Method of applying a male incontinence device |
| Applicant's invention is an apparatus including a sheath made of an extremely thin, flexible ... |
|
Waste-gas suppressor for internal-combustion engines |
| What I claim is: 1. A water-gas suppressor for internal-combustion engines, the latter including a ... |
|
Internal combustion engine magneto-type ignition system with electronically controlled spark advance |
| We claim: 1. Internal combustion engine ignition system having a magneto generator (10) having a ... |
|
Device fabrication by X-ray lithography utilizing stable boron nitride mask |
| Hydrogen-containing (or hydrogenated) boron nitride of the type priorly used to form mask ... |
|
Metal processing composition |
| What is claimed is: 1. A metal processing composition which comprises a water-soluble cationic ... |
|
Silver halide photosensitive materials containing thiourea and analogue derivatives |
| What is claimed is: 1. A photographic silver halide emulsion comprising a 1,1,3,3-tetra-substituted ... |
|
|
DMOS power transistors with reduced number of contacts using integrated body-source connections
| Details |
Inventors: Bulucea, Constantin; Rossen, Rebecca;
Assignee: Siliconix Incorporated (Santa Clara, CA)
Primary Examiner: Ngo; Ngan V.
Assistant Examiner:
Attorney, Agent or Firm: Skjerven, Morrill, MacPherson, Franklin & Friel, Kwok; Edward C.
Two topologically different cells are disclosed that reduce the total number of contacts per device and that are applicable to mid- to high-voltage DMOS transistors. These cells use integrated connections between the source and the body that make them less sensitive to contact obturations by particle contamination or lithography imperfections. The topologies include either an elongated hexagonal cell or a buried-deep-body cell. Both cells are most efficient in high-current medium-voltage trench DMOS transistors, where the density of body contacts becomes prohibitive while the perimeter/area geometry factor is less critical. The disclosed embodiments are of the trench type of DMOS construction. The cells may, however, be implemented in planar DMOS transistors as well. |
|
DETAILED DESCRIPTION In accordance with the present invention, two topologically different microcells are provided. Each of these microcells is designed to reduce the total number of contacts per device in mid- to high-voltage DMOS transistors. These cells or microcells use integrated connections between the source region and the body region, so as to be less sensitive to contact obturations such as those caused by particle contamination. Each of these cells comprises either an elongated hexagonal cell or a buried deep-body cell. Both cells are most efficiently used in high-current trench DMOS transistors, where the density of body contacts becomes prohibitive. The cells may, however, be implemented in planar DMOS transistors as well. The invention will be more readily understood by reference to the drawings and the detailed description. As will be appreciated by one skilled in the art, the invention is applicable to power switching transistors in general, and is not limited to the specific embodiments disclosed.
|
| Related patents |
|
|
Trench depletion MOSFET
The present invention is a trench power MOSFET with a unique structure which overcomes the above-noted deficiencies of the prior art. Advantageously, the present ...
|
|
|
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** *** NO IMAGES AVAILABLE***
Description:...
|
|
|
Method for forming a MOSFET with substrate source contact
Accordingly, it is an object of the present invention to provide an improved means and method for MOSFETS having a back-side source contact. It is a further object to ...
|
|
|
Integrable MOS and IGBT devices having trench gate structure
OF ILLUSTRATIVE EMBODIMENTS FIG. 3 is a section view of a power MOSFET device in accordance with one embodiment of the invention, and FIG. 4 is a section view of an IGBT...
|
|
|
Bi-directional power trench MOS field effect transistor having low on-state resistance and low leakage current
I claim: 1. A trench MOSFET comprising: (a) at least one pedestal, that functions as a vertically-oriented body region, doped with a first conductivity type of dopant, ...
|
|
|
Insulated gate static induction transistor and integrated circuit including same
Therefore, an object of the present invention is to provide an insulated-gate static induction transistor which can operate in the enhancement mode or the enhancement/...
|
|
|
Mask surrogate semiconductor process employing dopant-opaque region
A general object of the present invention, therefore, is to provide a novel manufacturing procedure which is capable of reducing substantially the percentage likelihood ...
|
|
|
High speed, low gate/drain capacitance DMOS device
It is a purpose of the present invention to provide a new and improved method of producing high speed, low gate/drain capacitance DMOS devices. It is a further purpose ...
|
|
|
Method for the preparation of a pattern overlay accuracy-measuring mark
Therefore, it is an object of the present invention to overcome the above problems encountered in the prior art method of this type and to provide a method for the ...
|
|
|
Power insulated-gate transistor having three terminals and a manufacturing method thereof
OF THE PREFERRED EMBODIMENTS FIGS. 2 illustrates the structure of an insulated-gate transistor in accordance with a first preferred embodiment of the present invention. ...
|
|
|