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Laser texturing
| Details |
Inventors: Russell, Stephen D.; Sexton, Douglas A.; Kelley, Eugene P.;
Assignee: The United States of America as represented by the Secretary of the Navy (Washington, DC)
Primary Examiner: Nelson; Peter A.
Assistant Examiner:
Attorney, Agent or Firm: Fendelman; Harvey, Keough; STATEMENT OF GOVERNMENT INTEREST
A non-contact method to impart a texture to a surface using laser irradiation uses an excimer laser to illuminate a sample immersed in a halocarbon ambient thereby initiating a photo/thermal chemical reaction which etches the sample only in the area illuminated with sufficient laser fluence. The resulting etched area can be repetively illuminated and etched to provide a textured surface to reduce extraneous reflections, or for micromachining, decorative texturing and marking. This technique is particularly well suited to improve the performance of backside illuminated CCDs by reducing the background (dark) signal, increase resolution and responsivity uniformity. The technique is compatible with other laser processing procedures and can be implemented with a variety of CCD enhancements such as improved dark current and blue response from laser doping or activation of backside implants. The non-corrosive nature of the halocarbon ambients allows the laser texturing process to be performed on pre-packaged, pre-tested devices and therefore can salvage parts which had failed performance specifications. This process therefore can improve device performance as well as yield, reliability and fabrication costs. |
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DETAILED DESCRIPTION The present invention is directed to providing a contactless technique for imparting a texture to a surface by promoting a chemical etching reaction between a gaseous ambient, such as a chlorofluorocarbon, and a sample, such as silicon, exposed to the UV energy emitted by an excimer laser.
An object of the invention is impart a texture to a surface.
Another object is to eliminate spurious reflections eminating from a surface by imparting a roughened texture.
Yet another object is to impart a surface texture without contact with the surface in question.
Another object is to texture a surface locally using a laser to achieve accurate spatial control for both "active" and "passive" applications described above.
An object of the invention is to reduce the processing steps associated with microelectronic fabrications.
Another object is to provide a microelectronic processing method utilizing a nonreactive or noncorrosive ambient.
Another object is to provide a laser texturing process with halocarbons that only react with silicon where the laser energy is impinging with sufficient fluence.
Another object is to provide a laser texturing process with chlorofluorocarbons that only react with silicon where the laser energy is impinging with sufficient fluence.
Another object is to provide a laser texturing process for etching in a pretested package die without expensive handling, damage or complex masking.
Another object is to provide a laser texturing process for etching in a pretested package die thereby enabling the reworking of a die which had failed performance specifications.
Yet another object is to provide a laser texturing process for etching in a pretested package die thereby salvaging parts that could not be reworked by conventional techniques.
Another object is to provide a laser texturing process in an ambient that significantly eliminates processing steps, thereby increasing reliability and yield.
Another object is to provide a laser texturing process in a halocarbon ambient that significantly eliminates processing steps, thereby increasing reliability and yield
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