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Method for manufacturing siloxane compounds
| Details |
Inventors: Okawa, Tadashi;
Assignee: Dow Corning Toray Silicone Co., Ltd. (Tokyo, JP)
Primary Examiner: Marquis; Melvyn I.
Assistant Examiner: Milstead; Mark W.
Attorney, Agent or Firm: Fletcher; Melvin D.
A method for manufacturing a siloxane compound described by formula R.sup.1.sub.m Si{OSi(CH.sub.3).sub.2 H}.sub.(4-m) comprising reacting a silane compound or condensation product of a silane compound described by formula R.sup.1.sub.m Si(OR.sup.2).sub.(4-m), where R.sup.1 is selected from the group consisting of hydrogen and substituted or unsubstituted monovalent hydrocarbon groups, R.sup.2 is hydrogen, alkyl groups and alkoxyalkyl groups, and m is an integer from 0 to 3, with 1,1,3,3-tetramethyldisiloxane in an aqueous solution of an acid in which the acid concentration is 1.0 wt % or less, and the molar ratio of the aqueous solution to the 1,1,3,3-tetramethyldisiloxane is in the range of 0.5 to 1.5. The method is particularly useful for manufacturing siloxane compounds having dimethylhydrodosiloxy groups. |
|
DETAILED DESCRIPTION I claim: 1.
A method for manufacturing a siloxane compound described by formula R.
sup.
1.
sub.
m Si{OSi(CH.
sub.
3).
sub.
2 H}.
sub.
(4-m) comprising reacting a silane compound or condensation product of a silane compound described by formula R.
sup.
1.
sub.
m Si(OR.
sup.
2).
sub.
(4-m) where R.
sup.
1 is selected from the group consisting hydrogen and substituted or unsubstituted monovalent hydrocarbon groups, R.
sup.
2 is selected from the group consisting of hydrogen, alkyl groups, and alkoxyalkyl groups, and m is an integer from 0 to 3, with 1,1,3,3-tetramethyldisiloxane in an aqueous solution of an acid in which the acid concentration is 1.
0 wt % or less, and the molar ratio of the water in the aqueous solution to the 1,1,3,3-tetramethyldisiloxane is in the range of 0.
5 to 1.
5.
2.
A method according to claim 1, where the aqueous solution of the acid comprises an aqueous solution of hydrochloric acid.
3.
A method according to claim 1, where the reacting is conducted in a temperature range of 0.
degree.
C.
to about 70.
degree.
C.
4.
A method according to claim 1, where the reacting is conducted in a temperature range of 20.
degree.
C.
to about 30.
degree.
C.
5.
A method according to claim 1, where the amount of 1,1,3,3-tetramethyldisiloxane used is 0.
5 moles or greater per mole of alkoxy groups, alkoxyalkoxy groups or hydroxy groups bonded to the silicon atoms of the silane compounds or partial condensation products.
6.
A method according to claim 1, where the amount of 1,1,3,3-tetramethyldisiloxane used be 0.
5 moles to 1.
0 moles of alkoxy groups, alkoxyalkoxy groups or hydroxy groups bonded to the silicon atoms of the silane compounds or partial condensation products.
7.
A method according to claim 1, where the amount of 1,1,3,3-tetramethyldisiloxane used be 0.
5 moles to 0.
75 moles of alkoxy groups, alkoxyalkoxy groups or hydroxy groups bonded to the silicon atoms of the silane compounds or partial condensation products.
8.
A method according to claim 1, where the 1,1,3,3-tetramethyldisiloxane in an aqueous solution of an acid in which the acid concentration is 0
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