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Home Semiconductor manufacture Method-for-patterning-high-density-field-emitter-tips

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 Method for patterning high density field emitter tips

Details
Inventors: Knappenberger, Eric J.; Wilson, Aaron R.;
Assignee: Micron Technology, Inc. (Boise, ID)
Primary Examiner: Powell; William A.
Assistant Examiner:
Attorney, Agent or Firm: TraskBritt

A method of forming a pattern in a layer of material on a substrate, comprising providing a plurality of spheres, covering the layer on the substrate with the plurality of spheres to form a mask, reducing the diameter of at least one sphere of the plurality of spheres, etching the layer on the substrate using the at least one sphere having a reduced diameter as a mask, and etching the substrate.

DETAILED DESCRIPTION The present invention is directed to a method of formation of a high density pattern for field emitter tips for FED's using microspheres or nanospheres.
The present invention includes a method of forming a pattern in a layer of material on a substrate, comprising providing a plurality of spheres, covering the layer on the substrate with the plurality of spheres to form a mask, reducing the diameter of at least one sphere of the plurality of spheres, etching the layer on the substrate using the at least one sphere having a reduced diameter as a mask, and etching the substrate.



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