 Process for the purification of virtually anhydrous organic liquids |
| We claim: 1. Process for purification of a virtually anhydrous organic liquid other than dimethyl ... |
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| Trialkyl Group VA metal compounds |
| OF THE INVENTION As used throughout this specification, the following abbreviations shall have the ... |
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| Process and auxiliary device for fabricating semiconductor devices |
| A process for fabricating individual semiconductor devices with mesa structures from a starting ... |
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| Process for manufacturing discrete electronic devices |
| OF THE INVENTION FIG. 1a shows an SOI substrate with a first silicon layer 10, an insulator layer 1... |
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| Process for manufacturing semiconductor devices with active structures |
| OF THE INVENTION The process of the present invention generally involves forming several ... |
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| Chip module with conductor paths on the chip bonding side of a chip carrier |
| This object is achieved with a chip module according to the invention, wherein the conductor paths ... |
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| Automatic analysis apparatus with liquid level detection function |
| In the automatic analysis apparatus stated above, the sample cup pipetted with the sample liquid ... |
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Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds
| Details |
Inventors: Favier, Jr., James G.; Ferreira, Lawrence; McFarland, Jr., John A.;
Assignee: OCG Microelectronic Materials, Inc. (Cheshire, CT)
Primary Examiner: Bowers, Jr.; Charles L.
Assistant Examiner: Young; Christopher G.
Attorney, Agent or Firm: Simons; William A.
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one polylactide compound; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition. |
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DETAILED DESCRIPTION As mentioned above, the radiation-sensitive compositions of the present invention have three critical ingredients; at least one alkali-soluble binder resin; at least one photoactive compound; and at least one polylactide compound.
Any or all binder resins commonly employed in photoresist compositions may be used herein.
The preferred class of binder resins is alkali-soluble resin or resins which are useful in positive-working photo-resist compositions.
The term "alkali-soluble binder resin" is used herein to mean a resin which will dissolve completely in an aqueous alkaline developing solution conventionally used with positive-working photoresist compositions.
Suitable alkali-soluble resins include phenolic novolaks such as phenol-formaldehyde novolak resins, cresol-formaldehyde novolak resins, or polyvinyl phenol resins, preferably those having an average molecular weight of about 500 to about 40,000, and more preferably from about 800 to 20,000.
The novolak resins are preferably prepared by the condensation reaction of phenol or cresols with formaldehyde and are characterized by being light-stable, water-insoluble, alkali-soluble, and film-forming.
The most preferred class of novolak resins is formed by the condensation reaction between a mixture of meta- and para-cresols with formaldehyde.
Any and all photoactive compounds which make radiation-sensitive mixtures useful as photoresists may be employed herein.
The preferred class of photoactive compounds (sometimes called "sensitizers") is o-quinonediazide compounds, particularly esters derived from polyhydric phenols, alkyl-polyhydroxyphenones, aryl-polyhydroxyphenones, and the like which can contain up to six or more sites for esterification.
The most preferred o-quinonediazide esters are derived from 3-diazo-3,4-dihydro-4-oxo-naphthalene-1-sulfonic acid chloride (also know as 1,2-naphthoquinonediazide-4-sulfonyl chloride) and 6-diazo-5,6-dihydro-5-oxo-naphthalene-1-sulfonic acid chloride (also known as 1,2-naphthoquinonediazide-5-sulfonyl chloride)
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Semiconductor manufacture 
