Home | Links | Contact Us | More About Intellectual Property | Bookmark
Search patents:
Home Semiconductor manufacture Polymer-composition-having-terminal-alkene-and-terminal-carboxyl-groups

 Silver halide photographic material comprising a polyoxyethylenic compound and a sensitizing dye
OF THE INVENTION The addition of the spectral sensitizing dye can be made during, at the beginning ...


 Drain source protected MNOS transistor and method of manufacture
OF THE PREFERRED EMBODIMENT A partial sectional view of a conventional drain source protected MNOS ...


 CMOS integrated devices in seeded islands
The low power consumption of integrated circuits fabricated in CMOS has made such structures the ...


 Junction-type field-effect transistor and its manufacture
What is claimed is: 1. A junction field effect transistor which comprises a semiconductor body ...


 Analgesic mixture of nalbuphine and ibuprofen
OF THE INVENTION Nalbuphine, which has the chemical name (-)-17-(cyclobutylmethyl)-4,5.alpha.-...


 Phthalidyl apovincaminate with cerebral eubolic activity
I claim: 1. The compound, 13a-ethyl-2,3,5,6,13a,13b-hexahydro-1H-indolo(3,2,1-de)pyrido(3,2,1-ij)(1,...


 Method of pharmacologically treating drug addiction with alpha-methyl-para-tyrosine
What is claimed is: 1. A method of preventing alpha-methyl-para-tyrosine crystalluria in a human ...


 Treatment of the acute after-effects resulting from alcohol ingestion
I claim: 1. A method for treating the acute after-effects of alcohol ingestion which comprises ...


 Method of treating abstinence syndrome with cycloaklyltriazoles
What is claimed is: 1. A method of treating symptons of nicotine abstinence syndrome comprising, ...


 Treatment of neurotransmitter-linked drug abuse
OF THE INVENTION The Biel patent describes numerous phenylalkylhydrazines, their preparation, and ...


 Polymer composition having terminal alkene and terminal carboxyl groups

Details
Inventors: Tsao, Jung-Hsien; Hein, Paul R.;
Assignee: W. R. Grace & Co. (Cambridge, MA)
Primary Examiner: Kittle; John E.
Assistant Examiner: Hamilton; Cynthia
Attorney, Agent or Firm: Barrett; Carole F., Baker; William L., McGreal; Michael J.

A polymer composition comprising a urethane having terminal unsaturation and a terminal carboxyl group and which is capable of further free radical polymerization has been synthesized. This polymer can be a liquid or a solid depending on the molecular weight and backbone of the polymer. This polymer as a liquid has been found to be very useful in producing printed circuit boards by photo resist processes.

DETAILED DESCRIPTION We claim: 1.
A method for producing a photo resist comprising: (a) (1) providing a composition containing a polymer wherein the polymer consists essentially of a polymer having the formula: ##STR6## wherein R.
sub.
1 is hydrogen, methyl or ethyl, R.
sub.
2 is alkyl of from 1 to 6 carbon atoms, R.
sub.
3 is alkyl, aryl or alkylaryl, (PE) is selected from the group consisting of polyethers, polyesters and mixtures thereof, x is an integer of from 2 to 50 and R.
sub.
4 is alkyl, alkene, aryl or alkyl or alicyclic.
(2) a photo initiator; (b) coating said composition onto at least a portion of a printed circuit board blank; and (c) contacting at least parts of said coated printed circuit board blank with actinic light radiation.
2.
A method for producing a photo resist as in claim 1 wherein said composition contains an additive having the formula: ##STR7## wherein R.
sub.
4 is hydrogen, methyl or ethyl, R.
sub.
5 is alkyl of from 1 to 6 carbon atoms and R.
sub.
6 is alkyl, alkene, aryl or alkyl or alicyclic.
3.
A method for producing a photo resist as in claim 1 wherein said photoinitiator is selected from the group consisting of benzophenone, acetophenone, acenaphthenequinone, O-methoxybenzophenone, dibenzosuberone, anthraquinone, hexanophenone and 2,2-dimethoxy 2-phenyl acetophenone.
4.
A method for producing a photo resist as in claim 2 wherein said composition contains a multifunctional acrylate.
5.
A method for producing a photo resist as in claim 4 wherein said composition additionally contains a multifunctional thiol.
6.
A method for producing a hot melt photo resist comprising: (a) (1) providing a composition containing a polymer having the formula: ##STR8## wherein R.
sub.
1 is hydrogen, methyl or ethyl, R.
sub.
2 is alkyl of from 1 to 6 carbon atoms, --PE-- is selected from the group consisting of polyethers, polyesters and mixtures thereof, x is an integer of from 2 to 50 and R.
sub.
4 is alkyl, alkene, aryl or alicyclic, and (2) a photo initiator; (b) heating said composition to more than 50



Related patents
  Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material
OF PREFERRED EMBODIMENTS The invention begins with a light-sensitive mixture containing a water-insoluble binder, which is soluble in aqueous-alkaline solutions, a ...
  Manufacture of a wear-resistant sliding surface
It is therefore an object of the present invention to provide a simple process for producing a sliding surface which provides a satisfactory oil-retaining capability ...
  Image forming method for forming a multicolor image from a half-tone dot exposure
OF THE INVENTION Silver halide color photographic light-sensitive materials relating to the invention are comprised of at least three layers each having a different ...
  Light-sensitive material containing silver halide, reducing agent and polymerizable compound with silver halide outside and inside of microcapsules
OF THE INVENTION Examples of the silver halide employable in the light-sensitive sensitive material of the present invention include silver chloride, silver bromide, ...
  Light-sensitive material containing silver halide, reducing agent and polymerizable compound wherein the silver halide comprises monodisperse tabular grains
OF THE INVENTION In the present invention, there is no specific limitation with respect to the halogen composition of the silver halide grain. Examples of the silver ...
  Light-sensitive copying material with o-quinone diazide and phenolic hydroxy compound
What is claimed is: 1. A light-sensitive copying material comprising (A) an anodized aluminum support and (B) a positive-working, light-sensitive copying layer ...
  Absorptive layer for optical lithography
OF THE INVENTION The compositions of this invention are useful in forming an absorptive layer in a multilayer resist recording medium. An absorptive coating formed from ...
  Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
OF THE INVENTION The present invention provides novel photoresist compositions which contain highly absorbant actinic bisazo phenolic dyes highly soluble in both ...
  Highly-sensitive high-contrast photographic materials
OF THE INVENTION As previously indicated, R.sup.1 of general formula (I) represents a monocyclic or bicyclic aryl group. The aryl group may be substituted with one or ...
  Positive acting photoresist comprising diazide ester, novolak resin and rosin
I claim: 1. An alkali soluble, positive working photoresist composition comprising a naphthoquinone (1,2)-diazide sulfonic acid ester photosensitizer, a novolak resin in ...

0.014

Archive: All patents - Links

Copyright (c)2006 Eipa-patents.org - All rights reserved