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Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
| Details |
Inventors: Trefonas, III, Peter; Zampini, Anthony; Madoux, David C.;
Assignee: Shipley Company Inc. (Newton, MA)
Primary Examiner: Bowers, Jr.; Charles L.
Assistant Examiner:
Attorney, Agent or Firm: Goldberg; Robert L.
This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye. |
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DETAILED DESCRIPTION OF THE INVENTION The present invention provides novel photoresist compositions which contain highly absorbant actinic bisazo phenolic dyes highly soluble in both casting solvent and aqueous alkaline developer, high resolution novolac resins, and high resolution PACs with several diazoquinone groups per molecule all dissolved into safer solvents with high solvency power.
The compositions of the present invention have the advantages of high resolution capability, improved control of reflection effects, high unexposed film thickness remaining after development, increased photoresist stability, and low required exposure dose.
Enhancing the actinic absorbance of positive photoresist diminishes undesirable reflection phenomena.
The absorbance at the wavelength of irradiation can be enhanced through the addition of dye to the photoresist.
The optimal dye should have the following properties: highly absorbing from 365 nm to 436 nm in the spectral region to allow use of the same composition on a variety of photolithographic exposure equipment; minimal absorbance at alignment wavelengths above 520 nm; high solubility in the photoresist solvent; shelf life of at least 6 months; solubility in aqueous alkaline developers; minimal trace metals contamination; does not sublime significantly during baking processing; does not significantly harm deep-UV curing processing and does not significantly reduce the dissolution rate of exposed photoresist in developer solution.
It is well known that as the photoresist actinic absorbance is increased, resist wall angle and resolution decrease.
In order to minimize the negative effect of increasing the actinic absorption on resolution, it is very important that the photoresist composition is designed to maximize the resist wall angle.
Certain specific combinations of dye compound, resin chemical composition, PAC chemical structure and solvent will yield satisfactory dyed photoresist compositions.
The bisazo phenolic dyes used in the compositions of the present invention have good solubility in the casting solvent and aqueous alkaline developer and a strong absorbance in the actinic range of 365 nm to 436 nm
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