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Non-woven fabric and method for producing same
It is a primary object of the present invention to eliminate the above drawbacks of the prior art and to provide a unique non-woven fabric and a method for producing the ...
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Fence wire location marker
A location indicator or marker for marking and indicating the location of substantially horizontally extending wires includes a generally planar tab or relatively thin, ...
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Process for fabricating a control gate for a floating gate FET
It is therefore, an object of the present invention to provide an improved method of fabricating a floating gate field effect transistor. A further object of the present ...
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Apparatus for mixing plastics
In general, the present invention consists of providing the mixing head with two plates mounted at a distance from each other and attached to the supply and return line. ...
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Fluid spreading apparatus
In accordance with the present invention a new and improved fluid spreading apparatus is disclosed as including a non-swinging or fixed spray bar carried transversely on ...
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Device in or for high-pressure cleaning units for heating the water by circulation
I claim: 1. High-pressure cleaning apparatus having two operating modes comprising: an ejection nozzle for discharging fluid; a high-pressure pump having delivery and ...
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High voltage MOS structure
The present invention relates generally to insulated gate field effect transistors and more specifically to an improved high voltage insulated gate field effect ...
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Method of making self-aligned remote polysilicon contacts
In accordance with the present invention, shallow source and drain contacts are produced by the steps of (1) depositing a polysilicon layer over the entire surface of a ...
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Self-aligned MOSFET gate/source/drain salicide formation
The present invention provides a method of fabricating a MOSFET device structure in a silicon substrate. The MOSFET device structure includes planarized trench isolation ...
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Raised source/drain using recess etch of polysilicon
Accordingly, it is a primary object of the present invention to provide a preferred process for making logic devices with raised source/drain junctions using recess etch ...
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