DETAILED DESCRIPTION OF THE INVENTION The invention includes compounds having at least one perfluorovinyl group and at least one functional group suitable for forming condensation polymers or a group suitable for conversion into such a functional group.
The functional group is preferably attached indirectly to the perfluorovinyl group via some linking structure thereto.
More preferably, the compounds have structures represented by Formula I: G.
sub.
n -R(-X--CF.
dbd.
CF.
sub.
2).
sub.
m wherein R represents an optionally substituted hydrocarbyl group, X represents any group which links R and a perfluorovinyl group; n is the number of G groups, preferably an integer of from 1 to about 4, more preferably from 1 to about 2; m is the number of (-X--CF.
dbd.
CF.
sub.
2) groups, preferably an integer of from 1 to about 3, more preferably from about 1 to about 2; G represents any reactive functional group or any group convertible into a reactive functional group, preferably any functional group suitable for reaction with di- or polyfunctional compounds to form polymers, which functional group (G) is, more preferably, insufficiently nucleophilic to react undesirably with perfluorovinyl groups at room temperature (e.
g.
25.
degree.
C.
), most preferably at temperatures used in subsequent reactions of the compound.
Alternatively, G is a group suitable for chemical conversion into a functional group suitable for reaction to form a polymer.
G is preferably selected from the group consisting of functional groups including hydroxyl groups (both alcoholic and phenolic), carboxylic acid groups, acyl halides such as chlorides, isocyanates, acyl azides, acetyl groups, primary or secondary amines, sulfide groups, sulfonic acid groups, sulfonamide groups, ketones, aldehydes, epoxy groups, primary or secondary amides, halo groups (e.
g.
chloro, bromo, iodo, and fluoro groups), nitro groups, cyano groups, anhydrides, imides, cyanate groups, vinyl, allyl, acetylene groups; and esters including thiocarboxylic and carboxylic esters, preferably lower alkyl esters such as methyl and ethyl esters, trihalomethyl groups including trichloromethyl groups, silicon-containing substituents such as alkyl silanes, siloxanes, chlorosilanes, phosphorus-containing groups such as phosphines, phosphate, phosphonate, boron-containing groups such as boranes, alkyl groups and alkoxy groups preferably containing from about 1 to about 12 carbon atoms when R is aromatic and the like
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Semiconductor manufacture 
