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 Separation columns and methods for manufacturing the improved separation columns

Details
Inventors: Regnier, Fred E.; He, Bing;
Assignee: Purdue Research Corporation (West Lafayette, IN)
Primary Examiner: Warden; Jill
Assistant Examiner: Noguerola; Alex
Attorney, Agent or Firm: Testa, Hurwitz & Thibeault, LLP

A separation column for use in a separation process such as chromatography, electrochromatography and electrophoresis is described. The separation column includes multiple collocated monolith support structures and interconnected channels defined by the support structures. The monolith support structures and interconnected channels are created on a substrate using an isotropic etching. The separation column also includes a cover plate disposed on the etched surface of the substrate, creating an enclosed separation column.

DETAILED DESCRIPTION In one aspect, the invention relates to a separation column, which is used in a separation process.
The separation column includes multiple collocated monolith support structures and interconnected channels defined by the support structures.
The collocated monolith support structures are arrayed in two dimensions to define channels that periodically split and merge.
In one embodiment, the support structures are in communication with each other at the first end of each support structure and a cover plate is in communication with the support structures at the second end of each structure.
In another aspect, the invention relates to a method for manufacturing a separation column, which is used in a separation process.
According to the method, a substrate is patterned to designate the areas of the substrate to be etched.
The patterned substrate is etched to create multiple collocated monolith support structures arrayed in two dimensions and interconnected channels defined by the support structures.
In one embodiment, a cover plate is attached on a surface of the created support structures to enclose the separation column.
In another embodiment, the substrate is etched to create the support structures and the channels that are substantially uniform in shape and size.
In yet another embodiment, the substrate is etched to create interconnected channels, in which each channel has an aspect ratio of from about 5 to about 100.
The aspect ratio as used herein is the ratio of the depth to the width of a channel between adjacent monolith structures, where the depth is a dimension perpendicular to the surface of the substrate and the width is a dimension parallel to the surface of the substrate and perpendicular to the flow direction in the channel.
In another aspect, the invention relates to a separation column.
The separation column includes an inlet, a separation region and an outlet.
The separation region is in communication with the inlet and comprises a plurality of collocated monolith support structures that are arranged in two dimensions



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