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Clean up of ethanolamine to improve performance and control corrosion of ethanolamine units
OF THE DRAWING Referring to FIG. 1, the crude gas 1 containing CO.sub.2 and/or H.sub.2 S is passed upwardly through the ethanolamine absorber column 5, where the crude ...
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Reactive compounds containing perfluorovinyl groups
OF THE INVENTION The invention includes compounds having at least one perfluorovinyl group and at least one functional group suitable for forming condensation polymers ...
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Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds
As mentioned above, the radiation-sensitive compositions of the present invention have three critical ingredients; at least one alkali-soluble binder resin; at least ...
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Perfluorocyclobutane ring-containing polymers
OF THE INVENTION Polymers of the invention are formed by thermal reaction of monomers having at least two dimerizable perfluorovinyl groups such that ...
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Process for removing metal ions from organic photoresist solutions
We claim: 1. A process for removing metal ions from organic solution containing one or more dissolved acid labile photoresist components without formation of by-products,...
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Purified tetraethoxysilane and method of purifying
OF THE INVENTION The invention in its broader aspects relates to a method of purifying tetraethoxysilane, comprising injecting impure tetraethoxysilane in the gaseous ...
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Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins
OF THE INVENTION The DVS monomers of this invention include compounds of the structure: ##STR2## wherein each R.sup.3 is independently C.sub.1-6 alkyl, cycloalkyl, ...
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Low dielectric resin composition
What is claimed is: 1. A low dielectric resin composition consisting essentially of the following components (a) and (b), wherein the dielectric constant of a coating ...
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Method for manufacturing siloxane compounds
I claim: 1. A method for manufacturing a siloxane compound described by formula R.sup.1.sub.m Si{OSi(CH.sub.3).sub.2 H}.sub.(4-m) comprising reacting a silane compound ...
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Polyphenylene oligomers and polymers
OF THE INVENTION Preferably, the oligomers and polymers and corresponding starting monomers of the present invention are: I. Oligomers and polymers of the general ...
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