Semiconductor device and method of manufacturing the same
We claim: 1. A semiconductor device comprising a substrate; a semiconductor layer made of amorphous silicon formed over said substrate; a transparent conductive layer formed by an interfacial reaction... Read More
Inventors: Yamamoto, Hideaki; Seki, Koichi; Tanaka, Toshihiro; Sasano, Akira; Tsukada, Toshihisa; Shimomoto, Yasuharu; Nakano, Toshio; Kanamori, Hideto;, Assignee: Hitachi, Ltd. (Tokyo, JP) |
Thin-film transistor fabrication process
The present invention provides a thin-film transistor fabrication process in which, after the gate insulation layer is formed and before the a-Si semiconductor layer is formed, the surface of the gate... Read More
Inventors: Nomoto, Tsutomu; Yosida, Mamoru; Mouri, Mikio; Watanabe, Tsukasa;, Assignee: Oki Electric Industry Co., Ltd. (Tokyo, JP) |
Method of fabricating amorphous silican diode addressed liquid crystal display
We claim: 1. A method of making a display of the type including at least one pixel including at least one pair of isolation devices, said method comprising the steps of: (A) providing an insulative su... Read More
Inventors: Yaniv, Zvi; Cannella, Vincent D.; Hansell, Gregory L.; Swartz, Louis D.;, Assignee: Ovonic Imaging Systems, Inc. (Troy, MI) |
Multi-element type radiation detector
It is therefore an object of the present invention to provide a multi-element type radiation detector which minimizes sensitivity variance between elements and moreover, which can be fabricated and pa... Read More
Inventors: Takahashi, Tetsuhiko; Takeuch, Hirosh; Shimada, Toshikazu; Itoh, Haruo; Hirai, Tadaaki; Maio, Kenji; Okajima, Kenichi; Yoshida, Minoru; Yamamoto, Hideaki;, Assignee: Hitachi, Ltd. (Tokyo, JP) |
Sensor matrix
We claim: 1. A sensor matrix comprising: a plurality of radiation sensitive sensors in a two dimensional matrix of columns and rows, each sensor comprising: a first electrode; a second electrode; a se... Read More
Inventors: Conrads, Norbert; Schiebel, Ulrich; Wieczorek, Herfried;, Assignee: U.S. Philips Corporation (New York, NY) |
High sensitivity, high resolution, solid state x-ray imaging device with barrier layer
In accordance with the present invention an x-ray imaging array comprises a photodetector array having topographically patterned surface features in combination with a structured scintillator array in... Read More
Inventors: Kingsley, Jack D.; Kwasnick, Robert F.; Wei, Ching-Yeu; Saia, Richard J.;, Assignee: General Electric Company (Schenectady, NY) |
Method for producing an active matrix substrate
The method for producing an active matrix substrate of this invention, which overcomes the above-discussed and numerous other disadvantages and deficiencies of the prior art, wherein the active matrix... Read More
Inventors: Mitani, Yasuhiro; Ikubo, Katsumara; Shimada, Yasunori; Tanaka, Hirohisa; Morimoto, Hiroshi; Nishi, Yutaka; Yamamoto, Tomohiko; Nishimura, Kenichi;, Assignee: Sharp Kabushiki Kaisha (Osaka, JP) |
Method and apparatus for acquiring an X-ray image using a solid state device
The present invention comprises an X-ray image capture element including a dielectric substrate layer having a top surface and a bottom surface. A plurality of transistors is arrayed adjacent the top ... Read More
Inventors: Lee, Denny L. Y.; Cheung, Lawrence K.;, Assignee: E. I. Du Pont de Nemours and Company (Wilmington, DE) |
Detection of alpha radiation in a beta radiation field
According to the present invention, an apparatus for detecting alpha particles in the presence of beta particles is provided, comprising an alpha spectrometer, means for generating a magnetic field wi... Read More
Inventors: Mohagheghi, Amir H.; Reese, Robert P.;, Assignee: Sandia Corporation (Albuquerque, NM) |
Method of forming variable sensitivity transmission mode negative electron affinity photocathode
The present invention is comprised of a technique for achieving a variable sensitivity transmission mode NEA photocathode by varying the backsurface recombination velocity of the photoemitter layer, t... Read More
Inventors: Gutierrez, William A.; Wilson, Herbert L.;, Assignee: The United States of America as represented by the Secretary of the Army (Washington, DC) |
Process for forming apertures in silicon bodies
Accordingly, it is an object of this invention to provide an improved process for precisely locating and shaping holes in semiconductor material. It is a further object of this invention to form an im... Read More
Inventors: Abbas, Shakir A.; Dockerty, Robert C.; Poponiak, Michael R.;, Assignee: International Business Machines Corporation (Armonk, NY) |
Method of manufacturing a semiconductor device utilizing etch and refill to form isolation regions
A first object of this invention is to provide a novel method of forming an isolation region as is free from the disadvantage described above. A second object of this invention is to provide a method ... Read More
Inventors: Muramatsu, Akira;, Assignee: Hitachi, Ltd. (Tokyo, JP) |
Method for making solid element fluid filter for removing small particles from fluids
The present invention resides in a rugged filter element, filter, and method for their manufacture. Using the filter element of the invention, a filter removes particles of greater than a preselected ... Read More
Inventors: Ellion, M. Edmund; Donatelli, Philip A.; Wolff, George;, Assignee: Hughes Aircraft Company (Los Angeles, CA) |
Porous inorganic siliceous-containing gas enriching material and process of manufacture and use
OF THE INVENTION In the following description and in the claims, the following terms have the described meanings. The term "gas" includes permanent gases that means gases at less than extreme tempera... Read More
Inventors: Hammel, Joseph J.;, Assignee: PPG Industries, Inc. (Pittsburgh, PA) |
Composite ceramic micropermeable membrane, process and apparatus for producing such membrane
The invention has the following features: the microporous layer is firmly bound to the geometric outer surface of the porous support, making the membrane structurally stable and suitable for multiple ... Read More
Inventors: Van 'T Veen, Willem H.; Engel, Albertus J. G.; Bonekamp, Benedictus C.; Veringa, Hubertus J.; Terpstra, Rinse A.;, Assignee: Hoogovens Groep BV (NL) |
Low temperature, single side, multiple step etching process for fabrication of small and large structures
It is an object of this invention to improve processes for forming fine structures in the surface of silicon wafers by etching processes. It is another object of this invention to produce both large a... Read More
Inventors: O'Neill, James F.;, Assignee: Xerox Corporation (Stamford, CT) |
Microporous materials
The invention involves a polymeric, microporous membrane material characterized by a continuous, triply-periodic, highly branched and interconnected pore space morphology having a globally uniform, pr... Read More
Inventors: Anderson, David M.;, Assignee: |
Process of production of integrated optical components
I claim: 1. A process for producing integrated optical components on a substrate, comprising the steps of: producing a first mask on said substrate so that only first regions of the substrate are not ... Read More
Inventors: Valette, Serge;, Assignee: Commissariat a l'Energie Atomique (Paris, FR) |
Structuring of printed circuit boards
Such foil circuit boards and semifinished products with metal platings can be produced according to the invention. In the method according to the invention for the production of multilayer foil circui... Read More
Inventors: Schmidt, Walter; Martinelli, Marco;, Assignee: Dyconex Patente AG (Zug, CH) |
Semiconductor strain gauge transducer
It is an object of the present invention to improve the accuracy of conversion and considerably expand the working temperature range of the semiconductor strain gauge transducer. The foregoing object ... Read More
Inventors: Beloglazov, Alexei V.; Beiden, Vladimir E.; Iordan, Georgy G.; Karneev, Vladimir M.; Papkov, Vladimir S.; Stuchebnikov, Vladimir M.; Khasikov, Viktor V.; Surovikov, Mikhail V.;, Assignee: |
Ultrafiltration apparatus
It is an object of this invention to provide an ultrafiltration apparatus that permits improved operation over a wide range of base liquid viscosities. Another object of the invention is an improved m... Read More
Inventors: Niesen, Lawrence J.;, Assignee: |
Uncooled far infrared thermal imaging system
This invention is an uncooled system for converting a far-infrared image to a visible image or near-infrared image. The system includes a transducer onto one side of which a far-infrared image is dire... Read More
Inventors: Bly, Vincent T.;, Assignee: The United States of America as represented by the Secretary of the Army (Washington, DC) |
Method of forming a flash EEPROM device by employing polysilicon sidewall spacer as an erase gate
What is claimed is: 1. A method of fabricating a Flash EEPROM device having an array of cells, the method comprising: 1) providing peripheral PMOS and NMOS transistors and a flash EEPROM device on a s... Read More
Inventors: Chang, Ming-Bing;, Assignee: |
Etchant and array substrate having copper lines etched by the etchant
Accordingly, the present invention is directed to an etchant and an array substrate having copper lines etched by the etchant that substantially obviates one or more of the problems due to limitations... Read More
Inventors: Jo, Gyoo-Chul; Chae, Ki-Sung;, Assignee: LG. Philips LCD Co., Ltd. (Seoul, KR) |
Micromechanical sensor
We claim: 1. A micromechanical sensor comprising a plurality of cantilever sensing elements supported on a substrate at respective support regions, a first set of said sensing elements having respecti... Read More
Inventors: Moore, David Frank; Hoole, Andrew Charles Frederick; Heaver, Alan;, Assignee: British Technology Group Limited (London, GB2) |
Structure or construction for mounting a pressure detector
The main object of the present invention is to solve the above-mentioned problem encountered when the diaphragm type pressure detector having the constitution shown in FIGS. 10 to 14 is actually appli... Read More
Inventors: Ohmi, Tadahiro; Hirose, Takashi; Ideta, Eiji; Ikeda, Nobukazu; Dohi, Ryousuke; Nishino, Kouji; Yoshikawa, Kazuhiro; Kagatsume, Satoshi; Hirose, Jun; Fukasawa, Kazuo; Koizumi, Hiroshi; Nagaoka, Hideki;, Assignee: Fujikin Incorporated (JP); Ohmi; Tadahiro (JP); Tokyo Electron Ltd (JP) |
Process for applying a composite insulative coating to a substrate
What is claimed is: 1. A process for applying an adherent electrically insulative moisture-resistant composite coating to a substrate, the process comprising the steps of: providing a thin, adherent, ... Read More
Inventors: Nichols, Michael F.; Hahn, Allen W.;, Assignee: The Curators of the University of Missouri (Columbia, MO) |
Shielded energy transmitting surgical instrument and methods therefor
Accordingly, it is a primary object of the present invention to overcome the above mentioned disadvantages of prior art instruments and methods of treating tissue with energy endoscopically. Another o... Read More
Inventors: Yoon, InBae;, Assignee: |
Separator for an alkaline cell and a method of producing the separator
What is claimed is: 1. A method of producing a separator for an alkaline cell, comprising the steps of: winding a base paper for a separator to form a cylindrical body, subjecting the thus formed cyli... Read More
Inventors: Yamashita, Katsuhiro; Murakami, Shuji; Tsutsui, Kiyohide; Ota, Hirohiko;, Assignee: FDK Corporation (Tokyo, JP) |
Coatings for cutting implements
We claim: 1. A method of treating an edged cutting implement which comprises depositing a coating of a refractory material on the implement by means of sputter ion plating, said sputter ion plating be... Read More
Inventors: Coad, Joseph P.; Keown, Samuel R.;, Assignee: United Kingdom Atomic Energy Authority (GB2) |
Semiconductor manufacture 
