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 Iron-doped indium phosphide semiconductor laser

Details
Inventors: Bishop, Stephen G.; McCombe, Bruce D.; Koschel, Wulf H.;
Assignee: The United States of America as represented by the Secretary of the Navy (Washington, DC)
Primary Examiner: Edlow; Martin H.
Assistant Examiner:
Attorney, Agent or Firm: Sciascia; R. S., Schneider; Philip, Crane; Melvin L.

An iron-doped indium phosphide or gallium arsenide semiconductor laser. The emiconductor material is doped when formed by uniformly distributing transition metal ions such as iron throughout the semiconductor. The concentration of the iron ions is from about 1.times.10.sup.15 to about 1.times.10.sup.18 ions per cubic centimeter, but is limited only by the solubility of iron indium phosphide or gallium arsenide. It has been determined that the greater the concentration of ions, the easier the laser emission is obtained. At liquid helium temperature, the iron-doped semiconductor laser will operate at a wavelength near 3 microns.

DETAILED DESCRIPTION An iron-doped III-V compound semiconductor laser operable in the 2 .
mu.
m to 3 .
mu.
m wavelength range.
Crystalline GaAs or InP semiconductors are doped with iron or another transition metal during their formation such that the iron ions are uniformly dispersed throughout the semiconductor.
The iron ions are excited so that the semiconductor emits light at an output wavelength which depends upon the characteristic excited state configuration of the iron ions.
Such a structure is simple to produce since the iron ions are added during the growth of the semiconductor crystal.
It has been determined that the iron ion concentration in InP may be as high as 2.
times.
10.
sup.
17 iron ions per cubic centimeter.



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