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 Positive working photoresist composition

Details
Inventors: Kawabe, Yasumasa; Satoh, Kenichiro; Aoai, Toshiaki;
Assignee: Fuji Photo Film Co., Ltd. (Kanagawa, JP)
Primary Examiner: Chu; John S. Y.
Assistant Examiner:
Attorney, Agent or Firm: Sughrue, Mion, Zinn, Macpeak & Seas

A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.

DETAILED DESCRIPTION OF THE INVENTION The present invention is now described in detail.
In R.
sub.
1 to R.
sub.
4 of formula (I) described above, the alkyl group having 1-8 carbon atoms includes methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-octyl, hydroxyethyl and cyclohexyl, and the alkyl groups having from 1 to 3 carbon atoms, such as methyl, ethyl, propyl, isopropyl and hydroxyethyl, are preferred.
Specific examples of the compounds represented by formula (I) are illustrated by the following compounds I-1 to I-5, although the compounds represented by formula (I) in the present invention are not limited to these compounds.
These polyhydroxy compounds can be used singly or in combination.
##STR5## Of the polyhydroxy compounds of formula (II), preferred compounds are those of formula (II) in which the hydroxybenzyl groups are bonded to the benzene rings at the ortho position relative to the hydroxyl group as shown below.
##STR6## In R.
sub.
11 to R.
sub.
20 of formula (II) described above, as the halogen atom, chlorine, bromine, and iodine are preferred; as the alkyl group, the alkyl groups having from 1 to 4 carbon atoms, such as methyl, ethyl, propyl, n-butyl, iso-butyl, sec-butyl, and t-butyl is preferred; and as the alkoxy group, the alkoxy group having from 1 to 4 carbon atoms, such as methoxy, ethoxy, hydroxyethoxy, propoxy, hydroxypropoxy, isopropoxy, n-butoxy, iso-butoxy, sec-butoxy, and t-butoxy is preferred.
Also, as the alkenyl group, the alkenyl group having from 2 to 4 carbon atoms, such as vinyl, propenyl, allyl, and butenyl is preferred.
As the aryl group, phenyl, xylyl, toluyl, and cumenyl are preferred; as aralkyl group, benzyl, phenetyl, and cumyl are preferred; as the alkoxycarbonyl group, methoxycarbonyl and ethoxycarbonyl are preferred; as the arylcarbonyl group, benzoyloxy is preferred; as the acyloxy group, butyryloxy and acetoxy are preferred; and as the acyl group, formyl, acetyl, butyryl, benzoyl, cyanamoyl, and valeryl are preferred.
Specific examples of the compounds represented by formula (II) are illustrated by the following Compounds II-1 to II-5 but the compounds of formula (II) used in the present invention are not limited to these compounds



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