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Home Telecommunications Gain-coupled-DFB-laser-with-index-coupling-compensation

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Details
Inventors: Makino, Toshi; Li, Guo P.;
Assignee: Northern Telecom Limited (Montreal, CA)
Primary Examiner: Epps; Georgia Y.
Assistant Examiner:
Attorney, Agent or Firm: MacGregor; George

A gain-coupled distributed feedback (DFB) laser or amplifier structure having a gain-coupling grating in the form of grooves periodically etched through strained, multi-quantum wells. The etched grooves are regrown with buffer material having a bandgap selected to compensate for index-coupling aid to block carrier leakage. The low carrier leakage reduces non-radiative recombination which in turn increases quantum efficiency.

DETAILED DESCRIPTION It is an object of the present invention to provide a high performance DFB lasing device.
It is a further object of the present invention to provide a purely gain coupled DFB laser demonstrating efficient, single-mode operation.
Therefore in accordance with a first aspect of the present invention there is provided a gain-coupled, distributed feedback (DFB), semi-conducting lasing device comprising a substrate, an active region on the substrate including material having a first bandgap E.
sub.
g1 and capable of generating light and gain in response to a current flowing therethrough.
A gain coupling grating having periodic grooves etched through the active region is provided.
The grooves are regrown with a first layer having a second bandgap E.
sub.
g2 wherein E.
sub.
g2 >E.
sub.
g1.
A second regrown layer on top of the first layer has a third bandgap, E.
sub.
g3 wherein: E.
sub.
g2 >E.
sub.
g3 >E.
sub.
g1.
A current confining ridge is on the active region and contacts are provided on the ridge and substrate.
In accordance with a second aspect of the invention there is provided a method of fabricating a gain-coupled DFB semi-conducting lasing device.
The method includes the steps of: (a) growing material capable of generating light and gain for optical amplification on a substrate, the material including a cladding layer, a first separate confinement layer, a plurality of quantum wells separated by quantum barriers, and a second separate confinement layer, the quantum wells having a first bandgap E.
sub.
g1 ; (b) etching periodic grooves through the quantum wells; (c) regrowing a first layer of a first material in the grooves, the first material having a second bandgap E.
sub.
g2 wherein E.
sub.
g2 >E.
sub.
g1 ; (d) regrowing a second layer of a second material on the first layer, the second layer having a third bandgap E.
sub.
g3 wherein E.
sub.
g2 >E.
sub.
g3 >E.
sub.
g1 ; (e) regrowing on the second layer a buffer layer, an etch stop layer, a second cladding layer and a capping layer; (f) forming a current confinement ridge in the capping and cladding layers; and (g) forming contacts on the ridge and substrate



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